US-based Qromis developed a novel substrate technology (called Qromis Substrate Technology, or QST) that can enable the growth of unique, high performance and low cost GaN circuit structures. QST supports large substrate sizes (6-inch, 8-inch, 12-inch and even larger) and devices from discrete to monolithic and eventually ICs with specifically designed engineered layers.
In 2020, Shin-Etsu licensed Qromis' GaN substrate technology, for the use in microLED deposition.
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