Researchers from Hong Kong University of Science and Technology (HKUST) have developed a deep-ultraviolt (UVC) microLED display array for use in lithography machines. The researchers say that the array feature enhanced efficiency, and is viable as a source for low cost maskless photolithography.
The researchers, in collaboration with the Southern University of Science and Technology, and the Suzhou Institute of Nanotechnology, have built a maskless lithography prototype platform and used it to fabricate the first microLED device by using deep UV microLED with maskless exposure, improving optical extraction efficiency, heat distribution performance, and epitaxial stress relief during the production process.
Earlier this year, researchers from Zhengzhou University have used dual polarization to improve the efficiency of deep ultraviolet (DUV) microLEDs.
