US-based Innovation Semiconductor developed (and patented) a monolithic vertical architecture for the production of MicroLED microdisplays, based on a 3D nanowire structure, a single material system and a straightforward and conventional integration between LEDs and GaN transistor.
The company seems to be at an early stage, and has yet to demonstrate its technology.
Company Address
260 E Main St Ste 2701
Rochester, NY 14604
United States
